Photopolymerization Fundamentals 2015
September 13 - 16, 2015
St. Julien Hotel, Boulder, CO USA

 

Welcome to the Photopolymerization Fundamentals 2015 Website!

By bringing together academic and industrial leaders in the photopolymerization field, this meeting will attempt to address critical, fundamental questions related to photopolymerization.

Call for Papers:

  • Abstract Deadline: May 20, 2015
  • Abstract submissions require a 200-500 word abstract.
  • Announcements for accepted contributions will be made by July 17, 2015. Please feel free to contact Neil Cramer (neil.cramer@colorado.edu) for questions regarding contributed oral and poster presentations


View Abstract Template


Online Abstract Submission Form Here

 


Topics that will be discussed at the meeting include (but are by no means limited to):

  • Novel Concepts
  • Radical and Cationic Polymerizations
  • Thiol-Ene Polymerizations
  • Oxygen Inhibition
  • Polymerization Kinetics
  • Novel Initiation Systems
  • Hydrogels and Biomaterials
  • Dental Materials
  • Additive Manufacturing
  • Composites
  • Smart and Responsive Networks
  • Emerging Applications

Speakers that plan to attend and present include:

  • Masamitsu Shirai, Osaka Prefecture University
  • Christopher Barner-Kowollik, Karlsruhe Institute of Technology
  • Ali Khademhosseini, Harvard
  • Christopher Bowman, University of Colorado
  • Devon Shipp, Clarkson University
  • Brent Summerlin, University of Florida
  • Jason Burdick, University of Pennsylvania
  • Dick Broer, Eindhoven University of Technology
  • Derek Patton, University of Southern Mississippi
  • Robert Liska, University of Technology - Vienna
  • Marco Sangermano, Politecnico di Torino
  • Masamitsu Shirai, Osaka Prefecture University
  • Xavier Allonas, Universite de Haute Alsace
  • Allan Guymon, University of Iowa
  • Hadley Sikes, Massachussetts Institute of Technology
  • Jeffrey Stansbury, University of Colorado - Denver
  • Stephanie Bryant, University of Colorado
  • Charles Musgrave, University of Colorado
  • Timothy White, United States Air Force Research Laboratory
  • April Kloxin, University of Delaware
  • Christopher Kloxin, University of Delaware
  • Jason Rolland, Carbon3D
  • Helmut Schlaad, Universität Potsdam
  • Chris Ellison, University of Texas
  • Celine Croutxe-Barghorn, Universite de Haute Alsace
  • Roberta Bongiovanni, Politecnico di Torino
  • Xavier Coqueret, Université de Reims Champagne-Ardenne
  • Tim Scott, University of Michigan
  • Bob McLeod, University of Colorado
  • Kurt Dietliker, ETH Zurich
  • Tom Scherzer, Leibniz Institute of Surface Modification

A unique format for talks will facilitate addressing of unanswered questions, leaving ample time for discussion and interaction between the speakers and the audience.

Highlights of the meeting include:

  • Numerous scientific presentations on various photopolymerization topics
  • An open atmosphere where presentation of difficult, unexplained results is encouraged
  • A poster session open to all who would like to submit posters
  • Reduced rates for students to promote interaction between industrial scientists and students
  • A short course consisting of four tutorial or review lectures from leaders in the photopolymerization community
  • A fabulous location

I hope that you will choose to join us for this meeting, and I look forward to seeing you!

Christopher N. Bowman
Conference Chair Professor and Gillespie Faculty Fellow
Department of Chemical & Biological Engineering
University of Colorado

 

Sponored by:
RadTech--The Assocation for UV and EB Technology
Colorado Photopolymer Solutions